22nd International Conference on Ion Implantation Technology (IIT 2018)
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The deadline for submission of abstracts has been extended to June 1, 2018
The IIT 2018 is an open forum for discussion of major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors, and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation.
The conference offers an excellent opportunity for engineers and researchers in industry, research institutes, and universities to present new results and to discuss ideas of new applications of ion implantation. The organizers welcome contributions from a wide range of topics, from fundamental research to industrial applications and equipment.